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Imec presents levers to reduce the CO2 equivalent footprint of lithography and etch for advanced technology nodes.
February 27, 2024
By: DAVID SAVASTANO
Editor, Ink World Magazine
This week, at the 2024 Advanced Lithography + Patterning Conference, imec presents an overview of advanced node lithography and etch related processes that contribute the most to direct emissions of CO2. Also, more sustainable patterning directions are proposed, including, for example, opportunities for dry etch processes and process simplification. Semiconductor devices fabricated in 2021 have a CO2 equivalent footprint of about 175 megatons, equivalent to the yearly emissions associated wit...
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